全磁浮渦輪分子幫浦
ATH 400M, ATH1300M ,ATH1600M,ATH2300M
300~2100 l/s pumping speed 設計
全新磁浮五向動平橫 & N2 purge & Heater 設計
適用PVD, CVD, Etch製程
- Glass coating,
- Micro systems machining,
- Ion beam rectification,
- Electron microscopy,
- Space simulation chambers,
- Particle accelerators,
- Semiconductor processes (etch, CVD, ion implant),
- Coating and thin films deposition,
- Ion milling
- And many R&D experiments
規格資料
| 型號 | 抽氣法蘭 | 抽氣效率for N2 | 安裝方向 |
| ATH 400M | ISO 100/160 | 410 l/s | Any |
| ATH 1300M | ISO 160/200 | 1250 l/s | Any |
| ATH 1600M | ISO 200/250 | 1500 l/s | Any |
| ATH 2300M | ISO 250 | 2100 l/s | Any |
